Essays about: "CHF3"

Found 1 essay containing the word CHF3.

  1. 1. Reactive Ion Etching of Silicon using F-based chemistry - Exploring the Limits

    University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionen

    Author : Harald Havir; [2018]
    Keywords : Reactive Ion Etching; Plasma Etching; CHF3; SF6; High Anisotropy; Physics and Astronomy;

    Abstract : Dry Etching is widely used in nanoprocessing as a method of pattern transfer onto a hard substrate, like silicon. Improving the resolution of this etch process is an important step in reducing the feature size in, for instance, computer microchips, or Nanoimprint Lithography stamps. READ MORE