Essays about: "thin-films"
Showing result 1 - 5 of 117 essays containing the word thin-films.
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1. Structural analysis of HZO thin film and electrode using X-ray diffraction
University essay from Lunds universitet/Synkrotronljusfysik; Lunds universitet/Fysiska institutionenAbstract : Since its discovery in 2011, the ferroelectricity of thin films based on HfO2 has been studied intensively. In particular, thin films with a 1:1 ratio of HfO2 and ZrO2 (HZO) has been of great interest. The ferroelectricity arises from a non-centrosymmetric orthorhombic (o) phase of HZO whose prevalence is dependent on the processing conditions. READ MORE
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2. Humidity dependent conductivity of air in HVDC applications and the role of surfaces
University essay from Uppsala universitet/Fasta tillståndets fysikAbstract : High Voltage Direct Current (HVDC) bushings are insulated devices designed to facilitate the safe passage of electric current across an earthed barrier. Understanding air conductivity is of utmost importance in the design of HVDC components, which is determined by ion density and ion mobility. READ MORE
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3. Crystallinity of Sputtered TiO2 Thin Films: a Study of the Heating and Plasma Influence on the Growth
University essay fromAbstract : AbstractHigh-Power Impulse Magnetron Sputtering (HIPIMS) of TiO2 thin films enhances their photocatalyticproperties compared to the films prepared by standard sputtering methods, especially when no substrateheating is employed. With no heating, the coatings present an amorphous structure that benefits from theionization of the sputtered flux granted by HiPIMS, with respect to their photocatalytic performance. READ MORE
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4. (1,3-di-tert-butyltriazenide) Cu(I) as vapor deposition precursor
University essay from Linköpings universitet/KemiAbstract : In the past few decades, devices such as computers have become smaller, and their performance has improved beyond comparison. Semiconductors and interconnectors are used in almost all devices today and are made of thin films. READ MORE
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5. A Quantum Chemical Investigation of Chemical Vapour Deposition of Fe using Ferrocene and Plasma Electrons
University essay from Linköpings universitet/KemiAbstract : Thin films provide a remarkable asset, as depositing a thin surface layer can completely alter a material’s characteristics and provide new, inexpensive, and valuable properties. In 2020, a new Chemical Vapour Deposition (CVD) approach was developed at Linköping University, using plasma electrons as reducing agents for the deposition of metallic thin films. READ MORE