Measurement and Characterization of 28 nm FDSOI CMOS Test Circuits for an LTE Wireless Transceiver Front-End

Abstract: This master thesis was part of a project at the Acreo Swedish ICT AB to investigate the 28 nm FDSOI CMOS process technology for the LTE front-end application. The project has resulted in a chip that contains different test circuits such as power amplifier (PA), mixer, low noise amplifier (LNA), RF power switch, and a receiver front-end. This thesis presents the evaluation of the RF power switch. At first, a stand-alone six-stacked single pole single throw (SPST) RF power switch was designed according to Rascher, and then it was modified to single pole double throw (SPDT) RF power switch according to the requirements of the project. This report presents an overview of the FDSOI CMOS process, basic theory of the RF switch, and the evaluation techniques. The post-simulation results showed that with the proper substrate biasing and matching (50 Ω), the RF switch will provide 2.5 dB insertion loss (IL) up to 27 dBm input power and over 30 dB isolation with 30 dBm input power at 2 GHz.