Essays about: "DC magnetron sputtering"
Showing result 1 - 5 of 22 essays containing the words DC magnetron sputtering.
-
1. Crystallinity of Sputtered TiO2 Thin Films: a Study of the Heating and Plasma Influence on the Growth
University essay fromAbstract : AbstractHigh-Power Impulse Magnetron Sputtering (HIPIMS) of TiO2 thin films enhances their photocatalyticproperties compared to the films prepared by standard sputtering methods, especially when no substrateheating is employed. With no heating, the coatings present an amorphous structure that benefits from theionization of the sputtered flux granted by HiPIMS, with respect to their photocatalytic performance. READ MORE
-
2. Heteroepitaxial Growth of GaN Film on Si substrate by Magnetron Sputtering
University essay from Linköpings universitet/Institutionen för fysik, kemi och biologiAbstract : In this study, the effect of AlN buffer layer structure and morphology on the GaN films deposited on Si (111) substrate by reactive DC magnetron sputtering have been studied. For structural and morphological characterization X-ray diffraction (XRD) and Scanning electron microscope (SEM) were used. READ MORE
-
3. Improving polarizing neutron optics by introducing 11B4C as interlayers
University essay from Linköpings universitet/TunnfilmsfysikAbstract : In this report, the effects of adding 11B4C as interlayers into Fe/Si multilayers is studied. Fe/Si multilayers are commonly used for neutron polarization at large research facilities, and improving the polarizing properties would improve their efficiency. READ MORE
-
4. Synthesis and thermoelectric properties of Cr1-xMexN (Me = Mo, V)
University essay from Linköpings universitet/TunnfilmsfysikAbstract : Among emerging materials systems for thermoelectric applications, the early transition-metal nitrides based on ScN and CrN show unexpectedly promising properties. These properties are determined by high Seebeck coefficient, low thermal conductivity, and high electrical conductivity. READ MORE
-
5. Magnetron Sputter Epitaxy of High-quality GaNand Plasma Characterization of the Process : Degree Project–Master’s Thesis
University essay from Linköpings universitet/TunnfilmsfysikAbstract : Several sputtering depositions were done by direct current (DC) magnetron sputtering epitaxy (MSE) techniquefor the goal of improving the growth rate and crystalline quality of GaN thin film on Al2O3 substrate. Thegrowth rate was higher when substrate-to-target distance D = 7 cm compared with D = 9. READ MORE