Essays about: "HPPMS"

Found 4 essays containing the word HPPMS.

  1. 1. Biaxial alignment in off-normally deposited films using highly ionized fluxes

    University essay from Institutionen för fysik, kemi och biologi; Tekniska högskolan

    Author : Tsung-Han Wu; [2013]
    Keywords : Biaxial alignment; biaxial texture; out-of-plane orientation; in-plane orientation; HiPIMS; HPPMS; Chromium;

    Abstract : The influence of highly ionized fluxes on the biaxial alignment in thin films has been investigated by studying the relation between the effect of ionization degrees and different process conditions, including magnetron position, working pressure and substrate bias voltage. In this thesis work, SEM and XRD techniques were employed to study the morphology and crystallographic properties of Cr films grown by High Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron Sputtering (DCMS) on Si substrate with a native SiO2 layer. READ MORE

  3. 2. Measurement of internal current densities during a HiPIMS discharge with a Rogowski coil

    University essay from Institutionen för fysik, kemi och biologi

    Author : Magnus Karlsson; [2011]
    Keywords : HiPIMS; HPPMS; plasma; electron transport; Rogowski coil;

    Abstract : In this study, the current densities in three different directions (r, φ and z) have been measured above the target during a HiPIMS discharge by the use of a Rogowski coil. This was done to examine the key transport parameter Jφ/JD┴ = ωge TEFF throughout the whole measured area, which is a key parameter describing how electrons are transported across magnetic field lines. READ MORE

  4. 3. Off-normal Film Growth by High Power Impulse Magnetron Sputtering

    University essay from Plasma och beläggningsfysik

    Author : Viktor Johansson; [2011]
    Keywords : HiPIMS; HPPMS; glancing angle deposition;

    Abstract : In this study we contribute towards establishing the process-microstructure relationships in thin films grown off-normally by ionized physical vapor deposition. High power impulse magnetron sputtering (HiPIMS) is used at various peak target powers and deposition rates to grow copper (Cu) and chromium (Cr) films from a cathode placed at an angle 90 degrees with respect to the substrate normal. READ MORE

  5. 4. Dynamic pressure measurements in high power impulse magnetron sputtering

    University essay from Institutionen för fysik, kemi och biologi

    Author : Rikard Forsén; [2009]
    Keywords : HiPIMS; HPPMS; sputtering; dynamic pressure;

    Abstract : A microphone has been used to measure the dynamic pressure inside a vacuum chamber during high power impulse magnetron sputtering with high enough time-resolution (~µs) to track the pressure change during the discharge pulse. An experimental measurement of the dynamic pressure is of interest since it would give information about gas depletion, which is believed to dramatically alter the plasma discharge characteristics. READ MORE