Essays about: "Reactive Ion Etching"

Showing result 1 - 5 of 13 essays containing the words Reactive Ion Etching.

1. 1. Real- and Quasi-Atomic Layer Etching for Ultra-High Resolution Patterning

   University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionen

   Author : Yoana Ilarionova; [2023]
   Keywords : Physics and Astronomy;

   Abstract : An attempt was made at developing atomic layer etching from a cyclic etching process in an ICP-RIE tool. During the process OES was used for contamination monitoring and estimation of the relative amount of Cl2 left in the chamber during the etch step of cyclic etching processes. READ MORE

3. 2. Damage Analysis of Reactive Ion and Atomic Layer Etched Silicon

   University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionen

   Author : Mohammad Al Abrash; [2023]
   Keywords : Technology and Engineering;

   Abstract : Dry etching is one of the most important methods of pattern transfer in nanofabrication. There are many dry etching methods, the most commonly used is reactive ion etching (RIE), that is based on a continuous supply of reactive ions and radicals generated in a radio-frequency (RF) plasma discharge. READ MORE

4. 3. BCP Lithography Defined Arrays of InAs NWs Grown Using MOVPE with Au Seeds

   University essay from Lunds universitet/Lunds Tekniska Högskola; Lunds universitet/Fasta tillståndets fysik

   Author : Björn Landeke-Wilsmark; [2022]
   Keywords : Physics and Astronomy;

   Abstract : In this report we outline a detailed process flow for a quick and inexpensive implementation of large dense arrays of InAs nanowires (NWs) grown in the reactive ion etching/etched (RIE) pores of a SiO2/SiNx mask on top of an InAs/Si(111) substrate. The self-assembled (hexagonally close-packed) pattern of poly(methyl-methacrylate) (PMMA) cylinders in a poly(styrene) (PS) matrix adopted by a linear diblock poly(styrene-block-methyl-methacrylate) P(S-b-MMA) block-copolymer (BCP) was transferred to the dielectric stack (consisting of a ≈10 nm plasma enhanced chemical vapour deposition/deposited (PECVD) SiNX layer topped by a thin atomic layer deposition/deposited (ALD) SiO2 film) using a two-step RIE procedure. READ MORE

5. 4. Block copolymer-based hybrid nanomaterials for nanoimprint applications

   University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Lunds Tekniska Högskola

   Author : Philip Sellin; [2022]
   Keywords : Block copolymer; Sequential infiltration synthesis; Nanoimprint lithography; Reactive ion etching; Self-assembly; Thermal annealing; Solvent vapour annealing; Nanoprocessing; Nanofabrication; Antibacterial; Technology and Engineering;

   Abstract : In this Master’s thesis project, a block copolymer (BCP) film was used in combination with sequential infiltration synthesis and etching to manufacture a nanoimprint lithography stamp consisting of silicon. The BCP film was designed to contain perpendicularly aligned hexagonally placed cylinders, a pattern that will later be investigated for antibacterial properties after being transferred via nanoimprint lithography to a polymer film. READ MORE

6. 5. Inductively-Coupled Plasma Etching for Nanoimprint Si-masters

   University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionen

   Author : Oskar Boström; [2019]
   Keywords : NIL; Semiconductor; EBL; SEM; ICP-RIE; Fluorine Etching; Physics; Technology and Engineering;

   Abstract : In the last decades, engineers have been pushing semiconductor technology towards fabricating ever smaller devices, and will eventually pass the lower limit of currently commonplace optical lithographic techniques. New techniques have been developed, such as nanoimprint lithography. READ MORE