Essays about: "Thermal nanoimprint lithography"
Found 4 essays containing the words Thermal nanoimprint lithography.
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1. Block copolymer-based hybrid nanomaterials for nanoimprint applications
University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Lunds Tekniska HögskolaAbstract : In this Master’s thesis project, a block copolymer (BCP) film was used in combination with sequential infiltration synthesis and etching to manufacture a nanoimprint lithography stamp consisting of silicon. The BCP film was designed to contain perpendicularly aligned hexagonally placed cylinders, a pattern that will later be investigated for antibacterial properties after being transferred via nanoimprint lithography to a polymer film. READ MORE
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2. Creating nanopatterned polymer films for use in light-emitting electrochemical cells
University essay from Umeå universitet/Institutionen för fysikAbstract : Thermal nanoimprint lithography (T-NIL) is a cheap and fast technique to produce nanopatterns in polymeric materials. It creates these patterns by pressing a stamp down into a polymer film that has been heated above its glass transition temperature. READ MORE
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3. Polymer structures for photovoltaics using colloidal self-assembly, thermal nanoimprinting and electrohydrodynamic annealing
University essay from Institutionen för fysikAbstract : The efficiency of an organic photovoltaic cell depends mainly on its morphology where an exciton has to migrate to a p-n junction to create a photocurrent. Therefore the distance from the bulk of the cell to a junction interface should not exceed the diffusion length of the exciton. READ MORE
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4. Development of a single-step fabrication process for nanoimprint stamps
University essay from Sektionen för Informationsvetenskap, Data– och Elektroteknik (IDE)Abstract : In this work we have investigated and developed an uncomplicated one step fabrication method to construct Nanoimprint Lithography (NIL) stamps with sub-100nm resolution. The fabrication method includes Electron Beam Lithographical (EBL) patterning using negative tone resist Hydrogen Silsesquioxane (HSQ). READ MORE