Essays about: "Litografi"

Showing result 1 - 5 of 6 essays containing the word Litografi.

  1. 1. Inductively-Coupled Plasma Etching for Nanoimprint Si-masters

    University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionen

    Author : Oskar Boström; [2019]
    Keywords : NIL; Semiconductor; EBL; SEM; ICP-RIE; Fluorine Etching; Physics; Technology and Engineering;

    Abstract : In the last decades, engineers have been pushing semiconductor technology towards fabricating ever smaller devices, and will eventually pass the lower limit of currently commonplace optical lithographic techniques. New techniques have been developed, such as nanoimprint lithography. READ MORE

  3. 2. Study of ohmic contact formation on AlGaN/GaN heterostructures

    University essay from KTH/Skolan för elektroteknik och datavetenskap (EECS)

    Author : Kai-Hsin Wen; [2019]
    Keywords : ohmic contacts; wide bandgap; Ta-based; recess etch; N-vacancies;

    Abstract : It is challenging to achieve low-resistive ohmic contacts to III-nitride semiconductors due to their wide bandgap. A common way to reduce the contact resistance is to recess the ohmic area prior to metallization. READ MORE

  4. 3. Offline study of next generation EUV pellicle materials and performances : From experimental design to material characterization

    University essay from KTH/Skolan för elektroteknik och datavetenskap (EECS)

    Author : Susanna Licheri; [2019]
    Keywords : Semiconductors; Nanotechnology; EUV Lithography; EUV Pellicle; Qualification study; Halvledare; nanoteknik; EUV litografi; EUV Pellicle; kvalificerings studie;

    Abstract : Lithography is the most crucial step in the semiconductor microfabrication workflow. Continuous features size shrinking co-occurs with the reduction of the exposure wavelength: a move from 193 nm light to extreme ultra-violet (EUV) at 13.5 nm is performed. The change poses a vast number of challenges that have been overcome in the past years. READ MORE

  5. 4. Automation of the design process of printed circuit boards : Determining minimum distance required by auto-routing software

    University essay from KTH/Skolan för elektroteknik och datavetenskap (EECS)

    Author : Simon Ström; Ali Qhorbani; [2018]
    Keywords : Printed circuit board; Industry 4.0; Lithography; Auto-routing; Minimum distance; Estimation; Mönsterkort; Industri 4.0; Litografi; Auto-routing; minsta avstånd; uppskattning;

    Abstract : This thesis project aims to create an overview of new technologies in printed circuit board manufacturing which when automated could become part of an Industry 4.0 production flow. Potential design limits imposed by new technologies are then applied in the creation process of a minimum distance estimation function. READ MORE

  6. 5. Block Copolymer Lithographyfor Nano-porous Oxide Thin Films

    University essay from KTH/Skolan för elektroteknik och datavetenskap (EECS)

    Author : Yandi Liu; [2018]
    Keywords : Block Copolymer; Lithography; Nanopatterning; Reactive-Ion Etching; Oxide Thin Films; Blockcopolymer; Litografi; Nanopakning; Reaktion-Jon Etsning; Oxidtunnfilmerna;

    Abstract : This thesis focuses on employing a new patterning technique called block copolymer lithography to transfer the nano-porous pattern from the polymer template to the underlying oxide thin film. Nano-porous block copolymer films are produced by spin-coating polymer solution on wafers followed by annealing, UV exposure and development processes. READ MORE