Numerical Simulation of 3.3 kV–10 kV Silicon Carbide Super Junction-MOSFETs for High Power Electronic Applications

Abstract: The thesis focuses on designing and characterizing SiC 3.3 kV Diffused Metal-Oxide Semiconductor Field-Effect Transistor (DMOSFET)s with a Ron that is significantly lower than that of current commercial devices. The On-state resistance and breakdown voltage are then adjusted by adding a Super-Junction structure. Because of the pillar structure below the p-base area, the depletion will occur both vertically and horizontally and keeps the electric field distribution throughout the drift layer constant. The Super Junction Metal-Oxide Semiconductor Field-Effect Transistor (SJ MOSFET) has a good advantage compared to DMOSFETs. Due to its capacity to tolerate higher breakdown voltages and the fact that it does not require an increase in cell pitch to reach higher voltages, the Super-Junction approach is now the subject of effective research as compared to IGBTs and DMOSFETs. Silicon Carbide , a material with a wide bandgap that facilitates high temperature operation, high blocking voltage, high current flow and high switching frequency, is used to construct the device. In order to maintain a consistent electric field throughout the device, the concentration of the n and p pillars was chosen with a good charge balance between them. The outcomes of designing and simulating a DMOSFET, a Semi-SJ MOSFET, and a Full SJ MOSFET are compared in this research. The semi SJ device resulted in a Ron of 18.4 mΩcm2 and a Vb of 4.1 kV. The full SJ device reached a Ron of 12.4 mΩcm2 and a breakdown voltage of 4.2 kV. One optimized device was chosen from the semi SJ devices and used in several TCAD simulations, and the outcomes were evaluated based on the JFET width, pillar thickness, and charge imbalance between the p and n pillars. In this study, the device was also modelled for 6.5 kV and 10 kV SiC blocking voltage capabilities; the findings are also discussed.