Investigation of Gallium Nitirde High Electron Mobility Transistors

Abstract: Gallium Nitride (GaN) based transistors have been in the spotlight for power electronics due to promising properties like high bandgap, high breakdown field, high electron mobility, and high-frequency applications. While there are some commercial devices based on these transistors available, there is still room for improvement in these devices for widespread usage. In this project, GaN-based transistors fabricated at RISE AB were investigated. These devices had previously shown high leakage current. Different approaches taken to reduce the said leakage current were analysed. The main scope of the thesis was static electrical testing of a new batch of these transistors at room temperature, mainly investigating their leakage current. The new transistors were subjected to surface treatments and also a new in-situ dielectric layer was used. The surface treatments did not show much improvement but the in-situ grown dielectric showed almost half of the initial leakage current. In addition to this different device architectures with varying gate length, gate width, and gate to drain distance were tested and compared. It was found that devices with 3 μm gate length and 12 μm gate to drain distance showed the best performance. The blocking characteristic of the transistors was also tested and the devices could withstand up to 350V. Suggestions to further identify the sources of the leakage current are presented. Possible improvement in the design of the transistors to increase the blocking voltage is also described.