Essays about: "Pattern mask"
Showing result 1 - 5 of 22 essays containing the words Pattern mask.
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1. Real- and Quasi-Atomic Layer Etching for Ultra-High Resolution Patterning
University essay from Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionenAbstract : An attempt was made at developing atomic layer etching from a cyclic etching process in an ICP-RIE tool. During the process OES was used for contamination monitoring and estimation of the relative amount of Cl2 left in the chamber during the etch step of cyclic etching processes. READ MORE
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2. Password habits of Sweden
University essay from KTH/Skolan för elektroteknik och datavetenskap (EECS)Abstract : The password is the first line of defence in most modern web services, it is therefore critical to choose a strong password. Many previous studies have found patterns to improve in global users password creation but none have researched the patterns of Swedish users in particular. READ MORE
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3. Color halftoning methods for screen printing and special effect pigments : Reproducing iridescent colors
University essay from Linköpings universitet/Institutionen för teknik och naturvetenskapAbstract : Iridescence is the property that makes colors vary by angle of observation. Technology has made it possible to print with ink that has this anisotropic property. The ink that is used contains microparticles and therefore only specific printing methods can be used, for example screen printing. READ MORE
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4. BCP Lithography Defined Arrays of InAs NWs Grown Using MOVPE with Au Seeds
University essay from Lunds universitet/Lunds Tekniska Högskola; Lunds universitet/Fasta tillståndets fysikAbstract : In this report we outline a detailed process flow for a quick and inexpensive implementation of large dense arrays of InAs nanowires (NWs) grown in the reactive ion etching/etched (RIE) pores of a SiO2/SiNx mask on top of an InAs/Si(111) substrate. The self-assembled (hexagonally close-packed) pattern of poly(methyl-methacrylate) (PMMA) cylinders in a poly(styrene) (PS) matrix adopted by a linear diblock poly(styrene-block-methyl-methacrylate) P(S-b-MMA) block-copolymer (BCP) was transferred to the dielectric stack (consisting of a ≈10 nm plasma enhanced chemical vapour deposition/deposited (PECVD) SiNX layer topped by a thin atomic layer deposition/deposited (ALD) SiO2 film) using a two-step RIE procedure. READ MORE
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5. Deterministic Nanopatterning of Graphene Using an Ion Beam
University essay from Uppsala universitet/Tillämpad kärnfysikAbstract : Graphene features a unique combination of exceptional properties and has emerged as one of the most promising nanomaterials for a variety of applications. The ability to structurally modify graphene with nanoscale precision enables the properties to be further extended. READ MORE