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1. Synchrotrons as a Source for Soft X-Ray Lithography
University essay from Lunds universitet/Synkrotronljusfysik; Lunds universitet/Fysiska institutionenAbstract : To move to lower modes in extreme ultra-violet lithography (EUVL) technology (and keep up with Moore’s law), new sources of soft X-ray radiation must be developed. It is clear from previous studies that Free Electron Lasers (FELs) can easily meet the in-band power requirements at these lower wavelength modes, however detailed studies for insertion devices (undulators) as a soft X-ray lithography (SXL) source are due for a re-evaluation. READ MORE
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